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Pointing device and method for manufacturing pointing device
专利权人:
FUJITSU COMPONENT LIMITED
发明人:
Nakajima Takashi,Seki Fujio
申请号:
US201313749250
公开号:
US9760185(B2)
申请日:
2013.01.24
申请国别(地区):
美国
年份:
2017
代理人:
Staas & Halsey LLP
摘要:
A pointing device includes: a film that includes a protruding portion which protrudes upward, and a plane portion which extends from the protruding portion; a first conducting layer that is disposed under the film; a second conducting layer that is disposed on a base material and is opposed to the first conducting layer; and a plurality of spacers that are formed on any one of a lower portion of the first conducting layer and an upper portion of the second conducting layer, and are arranged, between the first conducting layer and the second conducting layer, so as to be spaced mutually; wherein an interval between the spacers in an area of the plane portion is formed so as to become narrower than an interval between the spacers in an area of the protruding portion.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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