The present invention aims to provide a high-quality charge stripping film for a charge stripping device of ion beam, that has high heat resistance and high thermal conductivity, and that has high quality to the degree of withstanding a beam irradiation over a long period of time. The present invention is a charge stripping film for a charge stripping device of ion beam, wherein the charge stripping film is a carbon film produced by a polymer annealing method, and has a film thickness of not less than 10 µ m and not more than 150 µ m. The present invention comprises a charge stripping film for a charge stripping device of ion beam, wherein the charge stripping film is a carbon film having a thermal conductivity in a film surface direction at 25° C of not less than 300 W/mK, and has a film thickness of not less than 10 µ m and not more than 150 µ m. These stripping films preferably have a density of not less than 0.90 g/cm 3 and not more than 2.26 g/cm 3 , a weight per unit area of not less than 1.5
