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Method of inhibiting adhesion of by-product inside duct in treatment of waste gas by electron beam irradiation.
专利权人:
EBARA CORPORATION
发明人:
AOKI, SHINJI,MAEZAWA, AKIHIKO
申请号:
EP19880117493
公开号:
EP0313989(A1)
申请日:
1988.10.20
申请国别(地区):
欧洲专利局
年份:
1989
代理人:
摘要:
In a waste gas treating method wherein waste gas is treated by adding ammonia thereto and irradiating this waste gas with electron beams, the adhesion of a by-product to the inner wall of a duct (9) is inhibited by feeding the waste gas after irradiation with electron beams at a flow velocity of 10m/sec or less, more preferably 5 m/sec or less, until it at least reaches a first by-product collector (11). The duct may have a rectangular cross-sectional configuration. Thus, it is possible to inhibit increase in the pressure loss of the waste gas being treated and enable stable operation of the waste gas treating process.
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