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集束イオンビーム装置、それを用いた試料の加工方法、及び集束イオンビームを用いた試料の加工コンピュータプログラム
专利权人:
株式会社日立ハイテクサイエンス
发明人:
麻畑 達也,酉川 翔太
申请号:
JP20130061671
公开号:
JP6112929(B2)
申请日:
2013.03.25
申请国别(地区):
日本
年份:
2017
代理人:
摘要:
A focused ion beam system includes a focused ion beam irradiation mechanism which irradiates a sample, on which a protective film is formed, with a focused ion beam from above the sample, a processing control unit which performs a removal process on both sides of a region to be a thin piece portion of the sample by the focused ion beam and sequentially forms observation surfaces parallel to an irradiation direction of the focused ion beam so as to achieve the thin piece portion, and an observation surface image generation unit which generates an observation surface image. The processing control unit terminates the removal process when a height of the protective film in the irradiation direction of the focused ion beam becomes a predetermined threshold value or less in the observation surface image.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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