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METHOD AND DEVICE FOR ELECTRON BEAM ANALYSIS, AND ELECTRON MICROSCOPE
专利权人:
HITACHI, LTD.
发明人:
ANAN Yoshihiro,KOGUCHI Masanari
申请号:
WO2015JP63667
公开号:
WO2016181508(A1)
申请日:
2015.05.12
申请国别(地区):
世界知识产权组织国际局
年份:
2016
代理人:
摘要:
The present invention has an electron optical system for radiating an electron beam to a sample, a first detector for detecting a projection image from the electron beam radiated to the sample, a second detector for detecting a diffraction image from the electron beam radiated to the sample, a sample holder for retaining the sample so that the irradiation angle of the electron beam can be changed, and a control system for controlling the electron optical system and the sample holder, the control system measuring the amount of visual field deviation from the projection image before and after a change in the irradiation angle by the sample holder, controlling the irradiation position of the electron beam on the sample on the basis of the amount of visual field deviation, and performing control so that a diffraction image is acquired at the controlled irradiation position.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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