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DEPOSITION MASK, DEPOSITION DEVICE, DEPOSITION METHOD, AND DEPOSITION MASK MANUFACTURING METHOD
专利权人:
SHARP KABUSHIKI KAISHA
发明人:
KAWATO Shinichi,NIBOSHI Manabu,KOBAYASHI Yuhki,TAKIZAWA Kazuo
申请号:
US201515519058
公开号:
US2017244035(A1)
申请日:
2015.10.15
申请国别(地区):
美国
年份:
2017
代理人:
摘要:
A magnetic material section is provided on a mask substrate so as to be interposed between Y aperture lines of the mask substrate and between X aperture line of the mask substrate. A portion of the magnetic material section which portion is interposed between the X aperture lines has a first thickness and a second thickness which is less than the first thickness, the first thickness being that of each sub-portion thereof which is positioned between mutually adjacent ones of the Y aperture lines, the second thickness being that of each sub-portion thereof which is positioned between apertures which are mutually adjacent in a Y direction.
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中国工程科技知识中心
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http://www.ckcest.cn/home/

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