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Process for producing surface emitting laser, process for producing surface emitting laser array, and optical apparatus including surface emitting laser array produced by the process
专利权人:
Canon Kabushiki Kaisha
发明人:
Uchida, Tatsuro,Ikuta, Mitsuhiro,Takeuchi, Tetsuya
申请号:
EP20090009751
公开号:
EP2149946(A3)
申请日:
2009.07.28
申请国别(地区):
欧洲专利局
年份:
2017
代理人:
摘要:
Provided is a process for producing a surface emitting laser including a surface relief structure provided on laminated semiconductor layers, including the steps of transferring, to a first dielectric film, a first pattern for defining a mesa structure and a second pattern for defining the surface relief structure in the same process; and forming a second dielectric film on the first dielectric film and a surface of the laminated semiconductor layers to which the first pattern and the second pattern have been transferred. Accordingly, a center position of the surface relief structure can be aligned with a center position of a current confinement structure at high precision.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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