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Plasma treatment and plasma enhanced chemical vapor deposition onto temperature sensitive biological materials
专利权人:
David Staack
发明人:
David Staack,Tsung-Chan Tsai
申请号:
US13440615
公开号:
US08920361B2
申请日:
2012.04.05
申请国别(地区):
US
年份:
2014
代理人:
摘要:
A method and apparatus for depositing a film on a biological substrate are provided. A plasma generation device includes a dielectric conduit and a high voltage electrode. The plasma generation device is placed in proximity to the biological substrate and a gas supply that includes a precursor material is directed through the dielectric conduit. An electric field generated by the potential difference between the high voltage electrode and the biological substrate ionizes at least a portion of the gas supply and causes plasma to emanate from the dielectric conduit and contact the biological substrate. The plasma induces a reaction of the precursor material to form a film that is deposited on the biological substrate.
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