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SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
专利权人:
SCREEN HOLDINGS CO., LTD.
发明人:
NISHIYAMA Koji,INOUE Kazuhiro
申请号:
US201715661691
公开号:
US2018052393(A1)
申请日:
2017.07.27
申请国别(地区):
美国
年份:
2018
代理人:
摘要:
A substrate on which exposure processing has not been performed is carried into a placement cooling unit and cooled. The cooled substrate is held and carried out from the placement cooling unit by a transport device. In the case where an exposure device is able to receive the substrate, the substrate that has been carried out from the placement cooling unit is transported to the exposure device by the transport device. In the case where the exposure device is unable to receive the substrate, the substrate that has been carried out from the platform cooling unit is carried into a cooling buffer unit by the transport device. In the cooling buffer unit, a temperature of the substrate is maintained. After the exposure device becomes able to receive the substrate, the substrate is carried out from the cooling buffer unit and transported to the exposure device by the transport device.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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