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Metal-insulator-metal diodes and methods of fabrication
专利权人:
EMPIRE TECHNOLOGY DEVELOPMENT LLC
发明人:
Seike Aya
申请号:
US201314908899
公开号:
US9887271(B2)
申请日:
2013.07.31
申请国别(地区):
美国
年份:
2018
代理人:
Dorsey & Whitney LLP
摘要:
Provided herein are embodiments relating to metal-insulator-metal diodes and their method of manufacture. In some embodiments, the metal-insulator-metal diodes can be made, in part, via the use of an evanescent wave on a photo resist. In some embodiments, this allows for finer manipulation of the photo resist and allows for the separation of one piece of metal into a first and second piece of metal. The first piece of metal can then be differentially treated from the second (for example, by annealing another metal to the first piece), to allow for a difference in the work function of the two pieces of metal.
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中国工程科技知识中心
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http://www.ckcest.cn/home/

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