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Mask for Radiation Dosimetry
专利权人:
SCK.CEN
发明人:
Emiliano D'AGOSTINO,Luana DE FREITAS NASCIMENTO,Filip VANHAVERE,Clarita SALDARRIAGA VARGAS,Marijke DE SAINT-HUBERT,Emiliano DAGOSTINO
申请号:
US15529393
公开号:
US20170326387A1
申请日:
2015.11.25
申请国别(地区):
US
年份:
2017
代理人:
摘要:
The present invention describes a membrane mask for immobilization of a region of interest during radiation therapy. The mask comprises at least one material forming a matrix, and at least one radiation-sensitive material integrated as micro- or nano-sized material elements in or onto the matrix. The radiation-sensitive material advantageously provides the possibility of using the mask for performing dosimetry. Use of the mask and a method for performing dosimetry also are described.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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