Maska do dozymetrii promieniowania

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专利权人:

SCK CEN

发明人:

D'AGOSTINO, EMILIANO,DE FREITAS NASCIMENTO, LUANA,VANHAVERE, FILIP,SALDARRIAGA VARGAS, CLARITA,DE SAINT-HUBERT, MARIJKE

申请号：

PL15800850

公开号：

PL3223905T3

申请日:

2015.11.25

申请国别(地区):

PL

年份:

2019

代理人:

摘要：

The present invention describes a membrane mask for immobilization of a region of interest during radiation therapy. The mask comprises at least one material forming a matrix, and at least one radiation-sensitive material integrated as micro- or nano-sized material elements in or onto the matrix. The radiation-sensitive material advantageously provides the possibility of using the mask for performing dosimetry. Use of the mask and a method for performing dosimetry also are described.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/