SUBSTRATE SUPPORT STRUCTURE, CLAMP PREPARATION UNIT, AND LITHOGRAPHY SYSTEM

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专利权人:

Mapper Lithography IP B.V.

发明人:

DE JONG, Hendrik Jan

申请号：

EP20110704239

公开号：

EP2537304(B1)

申请日:

2011.02.18

申请国别(地区):

欧洲专利局

年份:

2017

代理人:

摘要：

A substrate support structure for clamping a substrate on a surface by means of a capillary layer of a liquid. The surface has an outer edge and includes one or more substrate supporting elements for receiving the substrate to be clamped, wherein the one or more substrate supporting elements are arranged to provide support for the substrate at a plurality of support locations. The substrate support structure further includes a sealing structure circumscribing the surface and having a top surface or edge forming a sealing rim. A distance between the outer edge of the surface and an outermost of the support locations is greater than a distance between the outer edge and the sealing rim.

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