A medical porous tantalum metal material is prepared by means of a chemical vapor deposition method, in which a tantalum metal compound is reduced to tantalum metal powder, and the tantalum metal powder is evenly deposited on the surface of a porous silicon support to form a tantalum coating, the tantalum metal compound being one of tantalum pentachloride and tantalum fluoride, the porosity of the porous silicon support being higher than 70%, the pore diameter of the porous silicon support being 100µm to 600µm, and the thickness of the tantalum coating being 10µm to 50µm. Also disclosed is a method for preparing the medical porous tantalum metal material.
