Electron beam exposure system and methods of performing exposing and patterning processes using the same

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专利权人:

Samsung Electronics Co., Ltd.

发明人:

Bae Sukjong,Choi Jin,Park Sunghoon

申请号：

US201514590145

公开号：

US9588415(B2)

申请日:

2015.01.06

申请国别(地区):

美国

年份:

2017

代理人:

Onello & Mello LLP

摘要：

An exposure system includes a data processing part that forms an exposure layout and an exposure part that irradiates an electron beam at a photoresist layer according to the exposure layout. The data processing part generates a control parameter for driving the exposure part without a pattern position error and a beam drift error and to prevent a discrepancy between the exposure layout and a mask layout to be formed in the photoresist layer. A controlling part controls the exposure part according to the control parameter.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/