A low irritancy cleansing composition comprises: (a) an anionic surfactant compound of formula (I): wherein R represents a C substituted or unsubstituted hydrocarbyl group each of R, R, R and R independently represents a hydrogen atom or a C alkyl group and wherein at least one of R, R, R and R is not hydrogen and M represents a cation and (b) an amphoteric surfactant wherein the molar ratio of component (a) to component (b) is from 0.25:1 to 4:1 and wherein the composition comprises less than 3 wt% polyethoxylated non-ionic species.
