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LOW IRRITANCY CLEANSING COMPOSITIONS
专利权人:
Philip Cotrell
发明人:
Philip Cotrell
申请号:
US13386706
公开号:
US20120142572A1
申请日:
2010.08.02
申请国别(地区):
US
年份:
2012
代理人:
摘要:
Composition A low irritancy cleansing composition comprises: (a) an anionic surfactant compound of formula (I): wherein R1 represents a C4-36 substituted or unsubstituted hydrocarbyl group each of R2, R3, R4 and R5 independently represents a hydrogen atom or a C1-4 alkyl group and wherein at least one of R2, R3, R4 and R5 is not hydrogen and M+ represents a cation (b) an amphoteric surfactant and (c) an alkoxylated non-ionic species wherein the molar ratio of component (a) to component (b) is from 0.5:1 to 2:1 and wherein the ratio of the mass of component (c) to the combined mass of components (a) and (b) is less than 1.2:1.
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