Ion implantation system and process for ultrasensitive determination of target isotopes

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专利权人:

BATTELLE MEMORIAL INSTITUTE

发明人:

Farmer, III Orville T.,Liezers Martin

申请号：

US201414482332

公开号：

US9443708(B2)

申请日:

2014.09.10

申请国别(地区):

美国

年份:

2016

代理人:

Matheson James D.

摘要：

A system and process are disclosed for ultrasensitive determination of target isotopes of analytical interest in a sample. Target isotopes may be implanted in an implant area on a high-purity substrate to pre-concentrate the target isotopes free of contaminants. A known quantity of a tracer isotope may also be implanted. Target isotopes and tracer isotopes may be determined in a mass spectrometer. The present invention provides ultrasensitive determination of target isotopes in the sample.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/