An implant with one or more outer surfaces extending in its longitudinal direction. The outer surface comprises one or more outer threads and an underlying wave pattern with long waves or intermediate-length waves. An oxide layer, a shot-peened layer or an etched layer is arranged on the top of said wave pattern. The long waves and preferably also the intermediate-length waves extend substantially in said longitudinal direction. The wave pattern with the long waves has a trough depth in the range of 75 to 150 µm. The wave pattern with the intermediate-length waves has a trough depth in the range of 10 to 75 µm.
