您的位置: 首页 > 农业专利 > 详情页

Gas processing equipment
专利权人:
アズビル株式会社
发明人:
大矢 康裕,岩田 昌之,井口 俊丸
申请号:
JP2017012386
公开号:
JP6757267B2
申请日:
2017.01.26
申请国别(地区):
JP
年份:
2020
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide a gas treatment device capable of realizing energy-saving control and humidity decrease control while emphasizing gas treatment capacity.SOLUTION: A gas treatment device has a mixing ratio applied voltage changing unit 9. In the mixing ratio applied voltage changing unit 9; a mixing ratio M controlled by a mixing controlling unit 7 is changed within a range from a practical upper limit mixing ratio Mmax to a practical lower limit mixing ratio Mmin on condition that current treatment capacity exhibited by a plasma treatment section 3 is maintained in a situation that a difference Δh (Δh=hF-hR) between first absolute humidity (absolute humidity of a mixing treating object gas D) hF and second absolute humidity (absolute humidity of a treated gas E) hR exists in a reference humidity difference range ΔhB±α; and a voltage V applied between electrodes in a plasma treatment section 3 is changed within a range from a practical upper limit voltage Vmax to a practical lower limit voltage Vmin.SELECTED DRAWING: Figure 1
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

意 见 箱

匿名:登录

个人用户登录

找回密码

第三方账号登录

忘记密码

个人用户注册

必须为有效邮箱
6~16位数字与字母组合
6~16位数字与字母组合
请输入正确的手机号码

信息补充