您的位置: 首页 > 农业专利 > 详情页

Method of two-step parylene patterning and etching to release a parylene sandwiched device
专利权人:
发明人:
Huanfen Yao,James Etzkorn,Harvey Ho
申请号:
US14302844
公开号:
US09743885B1
申请日:
2014.06.12
申请国别(地区):
US
年份:
2017
代理人:
摘要:
An example method involves: forming a first bio-compatible layer that defines a first side of a bio-compatible device forming a conductive pattern over a portion of the first bio-compatible layer mounting an electronic component to the electrical contacts forming a second bio-compatible layer over the first bio-compatible layer, the electronic component, the conductive pattern, wherein the second bio-compatible layer defines a second side of the bio-compatible device forming a first etch mask to partially cover the second bio-compatible layer, thereby exposing a first portion of the second bio-compatible layer removing the first portion of the second bio-compatible layer forming a second etch mask to partially cover the second bio-compatible layer, thereby exposing a second portion of the second bio-compatible layer and removing the second portion of the second bio-compatible layer.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

意 见 箱

匿名:登录

个人用户登录

找回密码

第三方账号登录

忘记密码

个人用户注册

必须为有效邮箱
6~16位数字与字母组合
6~16位数字与字母组合
请输入正确的手机号码

信息补充