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ION BEAM SPUTTERING WITH ION ASSISTED DEPOSITION FOR COATINGS ON CHAMBER COMPONENTS
专利权人:
Applied Materials, Inc.
发明人:
Sun Jennifer Y.,Firouzdor Vahid,Kanungo Biraja Prasad,Cho Tom K.,Achutharaman Vedapuram S.,Zhang Ying
申请号:
US201715711885
公开号:
US2018010234(A1)
申请日:
2017.09.21
申请国别(地区):
美国
年份:
2018
代理人:
摘要:
An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide is selected from a group consisting of YF3, Er4Al2O9, ErAlO3, and a ceramic compound comprising Y4Al2O9 and a solid-solution of Y2O3—ZrO2.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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