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MAKE UP KIT COMPRISING A BASE COMPOSITION RESISTANT TO MAKE UP REMOVAL
专利权人:
发明人:
Guillaume Kergosien
申请号:
US14648177
公开号:
US20150297499A1
申请日:
2013.12.04
申请国别(地区):
US
年份:
2015
代理人:
摘要:
The present invention relates to a kit for make-up and/or care of nails and/or false nails, comprising: —a composition C1 for make-up and/or care of nails and/or false nails comprising at least one film-forming polymer, said polymer being insoluble in acetone, methyl acetate, and ethyl acetate, and—a make-up removal composition C2 comprising at least one volatile solvent S2 selected from the group consisting of C2-C5 alcohols, C5-C12 alkanes, and mixtures thereof, said solvent S2 being able to solubilize the film-forming polymer of composition C1.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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