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電漿清潔裝置
专利权人:
ASIA PACIFIC PLASMA LTD.
发明人:
HEONG, CHUAN TAN,陈雄泉,陳雄泉
申请号:
TW103217091
公开号:
TWM496350U
申请日:
2012.10.29
申请国别(地区):
TW
年份:
2015
代理人:
摘要:
A kind of plasma-based cleaning device,System is provided with the control system to manipulate plasma-based cleaning device,It is provided with cavity in plasma-based cleaning device,And cavity hatch are provided with chamber door,When food carries out surface cleaning,Chamber door is set in what cavity and shut to food by system,Cavity is set to form sealed shape,Continuous manipulation plasma-based cleaning device makes to fill working gas in cavity,And with the low what 1500W of output power allows working gas ionization (ionization) to be ion and electronics and forms plasma-based,It generates plasma-based and food surface and collides and then clean food surface,And the operating temperature in cavity is 40 degree Celsius of low what,With effective cleaning food surface,And harm will not be generated to eater.一種電漿清潔裝置,係設置有用以操控電漿清潔裝置之控制系統,電漿清潔裝置內設置有腔體,且腔體開口處設置有腔門,當食品進行表面清潔時,係將食品置於腔體內並關上腔門,使腔體形成密閉狀,續操控電漿清潔裝置使腔體內填充工作氣體,並以輸出功率低於1500W讓工作氣體電離(ionization)為離子及電子而形成電漿,使電漿與食品表面產生碰撞進而清潔食品表面,且腔體內之工作溫度係低於攝氏40度,以有效的清潔食品表面,且不會對食用者產生危害。
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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