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反射防止膜、光学素子及び反射防止膜の製造方法。
专利权人:
株式会社タムロン
发明人:
長野 秀樹,澁谷 穣,山下 直城
申请号:
JP20120181978
公开号:
JP6081736(B2)
申请日:
2012.08.21
申请国别(地区):
日本
年份:
2017
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide an antireflection film and others, which suppress aggregation of hollow silica fine particles, can give a uniform film thickness, and can achieve a high antireflection performance while suppressing clouding or color irregularity.SOLUTION: The antireflection film includes a hollow silica layer comprising the following composite particles 130 bound by a binder coating 132. The composite particles comprise hollow silica primary particles 131 and a resin coating 132 covering an outer surface of each primary particle, in which the primary particles have a core-shell structure having an outer shell 131a made of silica and a hollow part 131b in the outer shell, and the primary particles have an average particle diameter Dof 100 nm or less and a particle diameter distribution within ±15%. In the layer, the primary particles 131 are regularly arrayed in two-dimensional directions of a substrate 20 via the resin coatings 132 so as to be separated by a predetermined distance, and vacanc
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