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X-RAY INSPECTION DEVICE AND X-RAY INSPECTION METHOD
专利权人:
HITACHI KOKUSAI ELECTRIC INC
发明人:
FUKAMACHI TETSUAKI
申请号:
JP20030202177
公开号:
JP2005043171(A)
申请日:
2003.07.28
申请国别(地区):
日本
年份:
2005
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide an X-ray inspection device and an X-ray inspection method capable of detecting surely a defect in order to solve the problems wherein a case is sometimes generated where a defect to be detected can not be detected accurately when a part having a different brightness level exists in an inspection visual field, and a complicated processing for adjusting a binary level at every time or the like is required. SOLUTION: This X-ray inspection method for detecting a defect of a sample by using a radiographic image comprises a step for setting an inspection window of the sample and a step for performing at least the first and second twice binarization processing based on a brightness signal level of the radiographic image in the inspection window. The second binarization processing is constituted so that the binarization processing is performed in a region determined based on the first binarization processing. COPYRIGHT: (C)2005,JPO&NCIPI
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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