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COMPOSITION OF NAIL POLISH REMOVER
专利权人:
发明人:
LIN HSIEN WEN
申请号:
IN2873/MUM/2011
公开号:
IN2011MU02873A
申请日:
2011.10.11
申请国别(地区):
IN
年份:
2013
代理人:
摘要:
The present invention discloses a composition of a nail polish remover to overcome the drawbacks of conventional nail polish removers that contain acetone, have irritating smells, and cause corrosive damages. The composition of the present invention includes gamma-butyrolactone with a weight percentage of 10% to 95%, water with a weight percentage of 2.3899% to 52.9% and an additive with a weight percentage of 2.6101% to 37.1%. The main composition used for removing nail polish is y-butyrolactone which has no irritating smell and less damage to nails.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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