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Composition of nail polish remover
专利权人:
HUNGKUANG UNIVERSITY
发明人:
YI, GUANG-HUI,易光辉,易光輝,WANG, XIAO-FEN,王晓芬,王曉芬,YI, MU-EN,易沐恩,易沐恩
申请号:
TW102103519
公开号:
TW201429500A
申请日:
2013.01.30
申请国别(地区):
TW
年份:
2014
代理人:
摘要:
A composition of nail polish remover comprises N-alkylpyrrolidone, water and additive, wherein the N-alkylpyrrolidone contains an alkyl group having 1 to 4 carbon atoms. Based on 100 parts by weight of the N-alkylpyrrolidone, the water content is 0.01 to 60.28 parts by weight, and the additive content is 0.01 to 32.79 parts by weight. The composition of said nail polish remover uses N-alkylpyrrolidone as the main ingredient, and all ingredients are raw materials for cosmetic care, it can significantly reduce the harmfulness to nail and inflammation-resistant, so as to greatly increase the safety.一種指甲油卸除劑之組成物,包含氮-烷基吡咯烷酮、水,及添加劑;其中,該氮-烷基吡咯烷酮的烷基的碳數範圍為1至4;以該氮-烷基吡咯烷酮為100重量份計,該水的含量為0.01至60.28重量份,該添加劑的含量為0.01至32.79重量份。該指甲油卸除劑之組成物是以氮-烷基吡咯烷酮為主要成份,且全成分皆為化妝保養品用原料,可明顯降低對指甲的傷害性,不易著火,可大幅提升安全性。
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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