CHANG, YAO TSUNG,张耀宗,張耀宗,LI, CHIA HSIEN,李佳宪,李佳憲,LIN, PAI YANG,林百洋,林百洋,CHUNG, SHUN CHI,锺顺麒,鍾順麒
申请号：
TW102147475
公开号：
TWI543751B
申请日:
2013.12.20
申请国别(地区):
TW
年份:
2016
代理人:
摘要：
A height measuring apparatus and a method thereof are disclosed. The disclosed method is suitable for an indoor environment. The disclosed method comprises emitting a first laser to a ceil via a first light path, determining whether a first reflective light corresponding to the first laser is received, emitting a second laser to an object via a second light path reflected by the ceil, determining whether a second reflective light corresponding to the second laser is received, calculating a first length according to a first data corresponding to the first reflective light, calculating a second length according to a second data corresponding to the second reflective light, and calculating an object height of the object according to the first length and the second length.本發明提出一種高度量測裝置及其方法,適用於具有反射面的環境,此高度量測方法包含沿第一光徑發射第一雷射光至反射面。判斷是否接收到對應於第一雷射光的第一反射光。若接收到第一反射光,依據對應於第一反射光的第一資料,計算第一長度值。沿第二光徑發射第二雷射光,第二雷射光被反射面反射至待測物。判斷是否接收到對應於第二雷射光的第二反射光。若接收到第二反射光,依據對應於第二反射光的第二資料,計算第二長度值。並且,至少依據第一長度值與第二長度值,計算待測物的待測物高度。11‧‧‧第一雷射光發射模組13‧‧‧第一光偵測模組18‧‧‧基板203‧‧‧第二光徑22‧‧‧第一反射面24‧‧‧使用者h1‧‧‧第一長度值d1‧‧‧第二長度值
