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Method and apparatus for treatment planning using implanted radioactive sources
专利权人:
Vibha Chaswal
发明人:
Vibha Chaswal,Bruce R. Thomadsen,Douglass L. Henderson
申请号:
US12413256
公开号:
US08409071B2
申请日:
2009.03.27
申请国别(地区):
US
年份:
2013
代理人:
摘要:
A pre-computed importance function providing ex ante assessment of optimal placement of a single radioactive source is used for sequential placement of multiple radioactive sources. As each source is placed, the importance function may be modified to reflect the dose implemented by that source and all sources already placed. The greedy algorithm employed by this technique makes possible optimization of additional dimensions of treatment planning including, using directional and isotropic sources, using different source isotopes, using optimum source strengths, using source locations that are not on the regular grid and using a single movable source for variable times at different locations.
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