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光触媒装置
专利权人:
株式会社レナテック
发明人:
稲垣 精一,上田 光洋
申请号:
JP2010276433
公开号:
JP5517907B2
申请日:
2010.12.10
申请国别(地区):
JP
年份:
2014
代理人:
摘要:
Provided is a photocatalyst device that can be implemented using a simple configuration, in which a photocatalyst filter can be cleaned and the performance of the filter restored during maintenance without removal of the filter from the position at which the filter is mounted (while the filter remains mounted). The photocatalyst device comprises a substantially flat plate-shaped photocatalyst filter module (20) including a photocatalyst filter (30) mounted in a substantially vertical direction a cleaning-water supply tube (31) having a slit, the cleaning-water supply tube being secured to the module (20) above the photocatalyst filter (30) and a cleaning-water storage unit (32) having a discharge outlet (21a) and a lid member, the cleaning-water storage unit being provided to the module (20) below the photocatalyst filter (30). When cleaning water (W) is supplied from the exterior to the cleaning-water supply tube (31), the cleaning water (W) flows from the slit along the photocatalyst filter (30) and is temporarily stored in the cleaning-water storage unit (32). When the cleaning water (W) reaches a predetermined amount, the lid member opens, and the cleaning water is discharged from the discharge outlet (21a).
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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