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DISCRIMINATION METHOD FOR DIAMETER OF SAMPLE MASK IN X-RAY FLUORESCENCE ANALYSIS AND X-RAY FLUORESCENCE ANALYZER
专利权人:
RIGAKU INDUSTRIAL CO
发明人:
OKUDA KAZUAKI,TODA KATSUHISA
申请号:
JP19980293211
公开号:
JP2000121583(A)
申请日:
1998.10.15
申请国别(地区):
日本
年份:
2000
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide such a discrimination method for the diameter of a mask that can eliminate a measuring error in an X-ray analysis without requiring a special apparatus and increasing the number of elements to be measured, and that can discriminate the diameter of the mask in a short time. SOLUTION: A sample stage 19 which supports sample 1 is moved in the radial direction of a mask 3. In parallel with this operation, scattered rays by one kind or a plurality of kinds of fluorescent X-rays B2 which are generated from a part on the mask 3 or by primary X-rays B1 which are reflected by the mask 3 are detected through a diaphragm hole 14A for visual-field restriction. The intensity of the detected X-rays is compared with a reference intensity, and the diameter of a mask hole 4 is discriminated.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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