A method of lithographically transferring a pattern (18) on a light sensitive surface (22) in a multiple exposure process comprises the following steps: a) providing a mask (16; 216; 316) comprising a first mask pattern area (181; 2181; 3181) and a second mask pattern area (182; 2182; 3182); b) directing projection light on the mask, thereby producing on the light sensitive surface a first exposed pattern area (301; 2301; 3301), which is an image of the first mask pattern area (181; 2181; 3181), and a second exposed pattern area (302; 232; 3302), which is an image of the second mask pattern area (182; 2182; 3182). The projection light illuminating the first and second mask pattern area has different angular light distributions. c) repeating step b) using the same mask (16; 216; 316) so that an image of the first mask pattern area (181; 2181; 3181) is superimposed on the second exposure pattern area (302; 232; 3302).
