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Semiconductor devices including epitaxial layers and related methods
专利权人:
Cree, Inc.
发明人:
Hull Brett Adam,Zhang Qingchun
申请号:
US201213608350
公开号:
US9640652(B2)
申请日:
2012.09.10
申请国别(地区):
美国
年份:
2017
代理人:
Myers Bigel, P.A.
摘要:
A semiconductor device may include a semiconductor layer having a first conductivity type, a well region of a second conductivity type in the semiconductor layer wherein the first and second conductivity types are different, and a terminal region of the first conductivity type in the well region. An epitaxial semiconductor layer may be on the surface of the semiconductor layer including the well region and the terminal region with the epitaxial semiconductor layer having the first conductivity type across the well and terminal regions. A gate electrode may be on the epitaxial semiconductor layer so that the epitaxial semiconductor layer is between the gate electrode and portions of the well region surrounding the terminal region at the surface of the semiconductor layer.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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