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플라즈마 장치
专利权人:
KIM; KI TAE
发明人:
KIM, KI TAE,김기태
申请号:
KR1020100095060
公开号:
KR1020120033505A
申请日:
2010.09.30
申请国别(地区):
KR
年份:
2012
代理人:
摘要:
PURPOSE: A plasma apparatus is provided to prevent the occurrence of discharging voltage increasing problems due to the expanded gap of a discharging electrode and a ground electrode by parallelly arranging the discharging electrode and the ground electrode.CONSTITUTION: A plasma apparatus(100) includes an insulating body(120), a discharging electrode(130), and a ground electrode(140). The discharging electrode is expanded in a rod form from the end part of the insulating body. The ground electrode is parallelly expanded with the discharging electrode from the end part of the insulating body. The virtual expanded lines of the ground electrode and the discharging electrode form an angle less than 15 degrees. The discharging electrode and the ground electrode are parallelly arranged. An air path(126) is arranged in the insulating body. The apparatus includes an air supplying part compulsively supplying external air to the air path.COPYRIGHT KIPO 2012플라즈마 장치는, 절연 몸체, 절연 몸체의 단부로부터 로드 형상으로 노출되는 방전 전극, 및 방전 전극과 마주하며 절연 몸체의 단부로부터 방전 전극과 나란하게 노출되는 접지 전극을 포함한다.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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