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PLASMA GENERATING DEVICE, PLASMA GENERATING SYSTEM AND METHOD OF PLASMA GENERATION
专利权人:
Leibniz-Institut für Plasmaforschung und Technologie e.V.
发明人:
Prof. Dr. Weltmann, Klaus-Dieter,Dr. Stieber, Manfred,Horn, Stefan,Turski, Phillipp,Dr. Brandenburg, Ronny
申请号:
DK15195015
公开号:
DK3171676T3
申请日:
2015.11.17
申请国别(地区):
DK
年份:
2020
代理人:
摘要:
A device for generating plasma (1) comprises a high voltage electrode (10) as well as at least one external electrode (11, 12), wherein the high voltage electrode (10) at least in one coordinate direction (34) is arranged between conductive material of at least one external electrode (11, 12). The high voltage electrode (10) is covered with a dielectric (21) at least one side facing an external electrode (11, 12). Between the respective external electrode (11, 12) and the high voltage electrode (10) over its longitudinal extension at least one spacer element (20) is present, which at least in the region of its arrangement electrically insulates the respective external electrode (11,12) from the high voltage electrode (10) and which positions the respective external electrode (11, 12) at a constant distance from the high voltage electrode (10), wherein the spacer element is a gas-permeable foil.
来源网站:
中国工程科技知识中心
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