REYES, Enrique, Antonio,LABLANC, Alyssa, Lynn,BEUTERBAUGH, Aaron M.
申请号：
WO2015US32666
公开号：
WO2016190865(A1)
申请日:
2015.05.27
申请国别(地区):
世界知识产权组织国际局
年份:
2016
代理人:
摘要：
A method of treating in a subterranean formation including placing a corrosion inhibitor composition into a subterranean formation, where the formation includes an acidic environment having a pH of about 5 or below, where the composition includes: an organic solvent comprising an alcohol with a flash point of at least about 75 °C; a nitrogen containing compound; an aqueous acid solution comprising HC1; and contacting a metal surface with the corrosion inhibitor composition. A corrosion inhibitor composition includes an organic solvent comprising an alcohol with a flash point of at least about 75 °C; a nitrogen containing compound; and an aqueous acid solution comprising HC1.
