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PRESSURE SENSING IMPLANT
专利权人:
ENDOTRONIX; INC.
发明人:
Harry Rowland,Michael Nagy,Nathan Plag,Tyler Panian,Suresh Sundaram
申请号:
US16851225
公开号:
US20200260991A1
申请日:
2020.04.17
申请国别(地区):
US
年份:
2020
代理人:
摘要:
Disclosed is an implant and method of making an implant. The implant having a housing that defines a cavity. The housing includes a sensor comprising a base attached to a diaphragm wherein said base may be positioned within said cavity. The sensor may be a capacitive pressure sensor. The diaphragm may be connected to the housing to hermetically seal said housing. The sensor may include electrical contacts positioned on the diaphragm. The base may define a capacitive gap and a vent wherein the electrodes may be positioned within said capacitive gap such that at least a portion of the electrical contacts extend through the vent. The implant may include a coil in electric communication with the sensor, said coil may be positioned within said housing. A printed circuit board having at least one component may be attached to the floating base.
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