A device is provided which ensures uniform irradiation of plants with infrared radiation along with ultraviolet and/or visible radiation and requires a small number of infrared emitters relative to the cultivation area. The infrared emitters are designed for temperatures of 800° C. to 1800° C. Each has a cylindrical emitter tube having a length of 50 mm to 500 mm. The emitter tubes extend parallel to one another in an emitter zone located above the culture plane. The infrared emitter occupation density relative to the area of the culture plane is between 0.2 m−2 and 1.0 m−2. Irradiation regions of adjacent infrared emitters on the culture plane overlap such that average irradiance on the culture plane is between 10 watt/m2 and 100 watt/m2 with a variation range of a maximum of 50%. A reflector facing a structural space is assigned to a top side of the emitter tube.
