您的位置: 首页 > 农业专利 > 详情页

SAMPLE STAGE AND CHARGED PARTICLE BEAM DEVICE USING SAME
专利权人:
HITACHI, LTD.
发明人:
ONO Shiano,KANASUGI Koji
申请号:
WO2015JP70984
公开号:
WO2017013790(A1)
申请日:
2015.07.23
申请国别(地区):
世界知识产权组织国际局
年份:
2017
代理人:
摘要:
The purpose of the present invention is to provide a high-resolution charged particle beam device allowing the rotational movement of a spherical support part from a side entry type sample stage to be performed highly accurately. The charged particle beam device comprises: a sample holding portion (132); a spherical support part (100) rotatably supporting the sample holding portion (132); a spherical support bearing part (110) serving as a rotation axis bearing; and, disposed between the spherical support part (100) and the spherical support bearing part (110), a vacuum seal member (120) for sealing the sample holding portion (132) in vacuum, and a support adjustment part (160) for supporting the weight of the spherical support part (100).
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

意 见 箱

匿名:登录

个人用户登录

找回密码

第三方账号登录

忘记密码

个人用户注册

必须为有效邮箱
6~16位数字与字母组合
6~16位数字与字母组合
请输入正确的手机号码

信息补充