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PHYSICAL VAPOR DEPOSITION USING ROTATIONAL SPEED SELECTED WITH RESPECT TO DEPOSITION RATE
专利权人:
UNITED TECHNOLOGIES CORPORATION
发明人:
Trubelja Mladen F.,Litton David A.,DePalma Joseph A.,Neal James W.,Maloney Michael,Beers Russell A.,Hazel Brian T.,Cotnoir Glenn A.
申请号:
US201515112213
公开号:
US2016333465(A1)
申请日:
2015.01.08
申请国别(地区):
美国
年份:
2016
代理人:
摘要:
A method for use in a physical vapor deposition coating process includes depositing a ceramic coating material from a plume onto at least one substrate to form a ceramic coating thereon, and during the deposition, rotating the at least one substrate at rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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