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Lithographic apparatus and device manufacturing method
专利权人:
Joeri Lof
发明人:
Joeri Lof,Joannes Theodoor De Smit,Roelof Aeilko Siebrand Ritsema,Klaus Simon,Theodorus Marinus Modderman,Johannes Catharinus Hubertus Mulkens,Hendricus Johannes Maria Meijer,Erik Roelof Loopstra
申请号:
US12853030
公开号:
US08344341B2
申请日:
2010.08.09
申请国别(地区):
US
年份:
2013
代理人:
摘要:
A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
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