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ABERRATION CORRECTING DEVICE FOR AN ELECTRON MICROSCOPE AND AN ELECTRON MICROSCOPE COMPRISING SUCH A DEVICE
专利权人:
TECHNISCHE UNIVERSITEIT DELFT
发明人:
KRUIT, Pieter
申请号:
WO2017NL50498
公开号:
WO2018016961(A1)
申请日:
2017.07.21
申请国别(地区):
世界知识产权组织国际局
年份:
2018
代理人:
摘要:
The invention relates to an aberration correcting device for correcting aberrations of focusing lenses in an electron microscope. The device comprises a first and a second electron mirror, each comprising an electron beam reflecting face. Between said mirrors an intermediate space is arranged. The intermediate space comprises an input side and an exit side. The first and second electron mirrors are arranged at opposite sides of the intermediate space, wherein the reflective face of the first and second mirror are arranged facing said intermediate space. The first mirror is arranged at the exit side and the second mirror is arranged at the input side of the intermediate space. In use, the first mirror receives the electron beam coming from the input side and reflects said beam via the intermediate space towards the second mirror. The second mirror receives the electron beam coming from the first mirror, and reflects the electron beam via the intermediate space towards the exit side. The incoming electron beam
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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