IMALAT TICARET ITHALAT IHRACAT A. S.;GOA TEKNOLOJI DANISMANLIK ELEKTRONIK
发明人:
Fatih Ahiska,Yavuz Ahiska,Tolga Ahiska
申请号：
US14269526
公开号：
US09522202B1
申请日:
2014.05.05
申请国别(地区):
US
年份:
2016
代理人:
摘要：
In a low temperature hydrogen peroxide gas plasma sterilizer, plasma within the sterilization chamber contributes to the sterilization process and decomposes the sterilant used at the end of a sterilization programs. The plasma however the must be properly profiled otherwise undesired surface etching may occur on the sensitive medical apparatus. This application describes a novel plasma control method and apparatus which minimize the harmful side effects plasma on the medical apparatus during a sterilization program.
