NMI NATURWISSENSCHAFTLICHES UND MEDIZINISCHES INST;NISCH, WILFRIED;GNAUCK, PETER
发明人:
NISCH, WILFRIED,GNAUCK, PETER
申请号：
WO1996DE01408
公开号：
WO9705644(A1)
申请日:
1996.07.24
申请国别(地区):
世界知识产权组织国际局
年份:
1997
代理人:
摘要：
The invention pertains to an "in situ" ion-etching device for local thinning of a specimen in the transmission electron microscope (1) with simultaneous electron microscopic observation. To that end, an ion beam element (2) is arranged in such a way that the finest possible ion probe is produced at the specimen site and can be scanned over the specimen surface. The ion beam (16) and specimen (10) therefore enclose the flattest possible angle. To compensate for the magnetic field of the objective lens (5), the ion beam (16) is diverted and led along a curved path to the specimen (10). In a preferred embodiment, an electrostatic cylinder capacitor sector field is included and effects double focusing. The ion probe can be positioned, via the raster ion image, on a selected region of the specimen by the secondary electrons (22) released on the specimen (10). The specimen position can be observed during the ion thinning process in electron transmission or electron diffraction. It is thus possible to carry out target preparations under high-resolution observing conditions and to eliminate contaminant or reactive layers.
