您的位置: 首页 > 农业专利 > 详情页

偏光解消素子並びにその素子を用いた偏光解消装置及び光学機器
专利权人:
リコーインダストリアルソリューションズ株式会社
发明人:
藤村 康浩,梅木 和博,成田 博和
申请号:
JP20150509861
公开号:
JP6076467(B2)
申请日:
2013.09.10
申请国别(地区):
日本
年份:
2017
代理人:
摘要:
A depolarization element in which a plurality of sub-wavelength structure regions having form birefringence are disposed on the surface-layer part of a substrate, wherein a depolarization element is provided having a structure allowing creation of various polarization states. In the depolarization element, the plurality of sub-wavelength structure regions having form birefringence are disposed on the surface-layer part of the substrate. The sub-wavelength structure regions have a sub-wavelength structure comprising ridges and grooves repeatedly disposed at a cycle shorter than the wavelength of the light used. Included as the sub-wavelength structure regions are sub-wavelength structure regions in which the region size in the direction of repetition of projections and indentations in the ridges and grooves of the sub-wavelength structure is within a range that corresponds to 5-25 times the repetition cycle of the ridges and grooves.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

意 见 箱

匿名:登录

个人用户登录

找回密码

第三方账号登录

忘记密码

个人用户注册

必须为有效邮箱
6~16位数字与字母组合
6~16位数字与字母组合
请输入正确的手机号码

信息补充