CHROME-FREE ETCH SOLUTIONS FOR CHEMICALLY RESISTANT POLYMER MATERIALS

• 收藏
• 分享

专利权人:

Rohm and Haas Electronic Materials LLC

发明人:

Mulzer Catherine

申请号：

US201815980899

公开号：

US2019032220(A1)

申请日:

2018.05.16

申请国别(地区):

美国

年份:

2019

代理人:

摘要：

Chemically resistant polymers are etched using a chrome-free etch solution which is aqueous and alkaline. The chrome-free etch aqueous alkaline solution is environmentally friendly and can be used in the preparation of chemically resistant polymers for electroless metal plating including the plating of through-hole walls in the manufacture of printed circuit boards.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/