PROBLEM TO BE SOLVED: To provide an electron beam sterilization method for equalizing an absorbed dose in an irradiated object in an electron beam sterilization method for sterilizing or sterilizing an irradiated object by irradiating the irradiated object with an electron beam. SOLUTION: This is an electron beam sterilization method in which an object to be transported is sterilized or sterilized by irradiating it with an electron beam, and the irradiation dose is close to an electron beam extraction window of a scan horn 16 of an electron beam irradiator. The adjusting means 20 is arranged, and the irradiation dose adjusting means 20 has a plurality of shielding materials 3 arranged along the longitudinal direction of the electron beam extraction window, and each of the shielding materials 3 independently receives an electron beam. It is possible to take an arrangement state that shields the electron beam and an arrangement state that does not shield the electron beam, depending on the distribution state of the focused irradiation region and the non-priority irradiation region in the irradiated object passing under the irradiation dose adjusting means. An electron beam sterilization method in which the shielding material corresponding to the focused irradiation region is in an arrangement state 3a that does not shield the electron beam, and the shielding material 3b corresponding to the non-priority irradiation region is in an arrangement state that shields the electron beam. [Selection diagram] Figure 2【課題】電子線を被照射物に照射して殺菌又は滅菌を行う電子線殺菌方法において、被照射物内の吸収線量を均一化する電子線殺菌方法を提供すること。【解決手段】搬送されている被照射物に電子線を照射して殺菌又は滅菌を行う電子線殺菌方法であって、電子線照射装置のスキャンホーン１６の電子線取出窓に近接して照射線量調整手段２０を配置し、照射線量調整手段２０は、電子線取出窓の長手方向に沿って配置された複数の遮蔽材３を有しており、遮蔽材３は、各々が独立して電子線を遮蔽する配置状態と電子線を遮蔽しない配置状態とを取り得るようになっており、照射線量調整手段の下方を通過する被照射物における重点照射領域と非重点照射領域の分布状態に応じて、重点照射領域に対応する遮蔽材は電子線を遮蔽しない配置状態３ａとし、非重点照射領域に対応する遮蔽材３ｂは電子線を遮蔽する配置状態とする、電子線殺菌方法。【選択図】図２
