PERISHABLE ELEMENT FOR PARTICLE BOMBARDMENT, SET OF DEVICES FOR PARTICLE BOMBARDMENT AND PERISHABLE ELEMENT AND METHOD FOR DETERMINING THE ETCHING PATTERN VIA PARTICLE BOMBARDMENT OF A TARGET
Fungible element (1) provided with a target (2) for particle bombardment, intended to carry out the vapour-phase physical deposition of a thin layer on a substrate (3), said fungible element (1) comprising a base layer (4) on which the target (2) is deposited, said target intended to be sputtered by the particle bombardment, wherein the target is formed by at least one layer (21) in which a plurality of zones (x i , y i ) is defined, having an average thickness (e j (x i , y i )) that is variable between the zones (x i , y i ) , said average thicknesses (e j (x i , y i )) of each zone ( x i , y i ) being dimensioned such that, in certain bombardment conditions, all the zones (x i , y i ) have an identical ion sputtering time (t j ). The invention also refers to a particle bombardment device (5) and fungible element (1) set and to the process to obtain such fungible element (1).
