波面収差計測方法、波面収差計測装置および光学素子の製造方法

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专利权人:

キヤノン株式会社

发明人:

加藤 正磨

申请号：

JP20130063405

公开号：

JP6124641(B2)

申请日:

2013.03.26

申请国别(地区):

日本

年份:

2017

代理人:

摘要：

The wavefront aberration measuring method includes measuring an intensity distribution of a measuring light transmitted through or reflected by an object to be measured, by using a light-receiving sensor, calculating a first differential wavefront which is a differential wavefront of the measuring light on the light-receiving sensor, and calculating a second differential wavefront by performing a correction process on the first differential wavefront depending on an incident angle of the measuring light to the light-receiving sensor. The method further includes calculating a wavefront aberration of the object by using the second differential wavefront.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/